| Course # | Course Name | Cr | Professor | Day of Class | Time | Room # |
| 1st Year | ||||||
| arch 104-01 | studio. I | 3 | williams | mwf | 1-2:50 | arch-w 101 |
| arch 104-02 | studio. I | 3 | livaudais | mwf | 1-2:50 | arch-w 105 |
| arch 118-01 | representation. II | 2 | delgado | tr | 1-2:50 | arch-w 101 |
| arch 118-02 | representation. II | 2 | livaudais | tr | 8-9:50 | arch-w 105 |
| 2nd Year | ||||||
| arch 204-01 | studio. III | 5 | bambury | mwf | 1-3:50 | arch-e 130 |
| arch 204-02 | studio. III | 5 | lockhart | mwf | 1-3:50 | arch-e 125 |
| arch 210-01 | history of architecture | 3 | smith | mwf | 11-11:50 | arch-w 104 |
| arch 212-01 | intro. to construction | 3 | bambury | tr | 1-2:50 | arch-e 207 |
| arch 213-01 | intro. to construction design | 2 | tr | 3-4:50 | arch-e 125 | |
| 3rd Year | ||||||
| arch 304-01 | arch. studio V | 5 | anderson | mwf | 1-3:50 | arch-e 130 |
| arch 310-01 | theory of arch. | 3 | smith | mwf | 9-9:50 | arch-w 104 |
| arch 316-01 | structures. III | 3 | tiner | tr | 9:30-10:50 | arch-w 103 |
| arch 318-01 | environ. control systems | 3 | watson | tr | 9:30-10:50 | arch-e 201 |
| arch 320-01 | comp. application in arch | 2 | anderson | tr | 1-2:50 | arch-w 202 |
| 4th Year | ||||||
| arch 404-01 | studio. VII | 5 | Lee (tiner) | mwf | 1-3:50 | arch-e 209 |
| arch 412-01 | const. design studio III | 3 | tiner | mwf | 10:30-12:20 | arch-e 132 |
| arch 414-01 | principles of city planning | 3 | lockhart | mwf | 10-11:50 | arch-e 103 |
| arch 416-01 | structures III | 3 | shih | tr | 8-9:30 | arch-e 103 |
| 5th Year | ||||||
| arch 462-01 | professional practice | 1 | clark | mwf | 5-7:50 | arch-e 201 |
| arch 496-01 | thesis I | 2 | choudhury | tr | 1-1:50 | arch-e 104 |
| arch 498-01** | professional studio IX | 5 | delgado | mwf | 1-4:50 | arch-e 131 |
Technical Electives
Computer Applications Courses
Electives
Spring Courses
* ARCH 462 is equivalent to ARCH 265, ARCH 366 & ARCH 464
** Mahjoub Elnimieri, PhD(Northwestern), Visting Professional Studio Critic
David Sharpe, MArch(Illinois Inst. Tech), Visiting Professional Studio Critic